Journals

Journals

The Hidden Potential of Polysilsesquioxane for High-k: Analysis of the Origin of its Dielectric Nature and Practical Low-Voltage-Operating Applications beyond the Unit Device (Adv. Funct. Mater. 7/2022)
Author
Heqing Ye, Hyeok‐jin Kwon, Su Cheol Shin, Hwi‐young Lee, Young Ho Park, Xiaowu Tang, Ruxian Wang, Kanghyuck Lee, Jisu Hong, Zhijun Li, Wonkyo Jeong, Jiyeong Kim, Chan Eon Park, Jihoon Lee, Tae Kyu An, Insik In, Se Hyun Kim
Journal
Advanced Functional Materials
Vol, Part
32
Page Number
2270042
Publication Year
2022
IF
19.924
JCR
96.98%