목록 A new photoresist based on hyperbranched poly (ary1ene ether phosphine oxide) Author Insik In, Hyosan Lee, Tsuyohiko Fujigaya, Masaki Okazaki, Mitsuru Ueda, Sang youl Kim Journal Polymer bulletin Vol, Part 49 Page Number 349-355 Publication Year 2003 IF 2.843 JCR 61.58% Link https://scholar.google.co.kr/citations?view_op=view_citation&hl=ko&use… 954회 연결