Journals

Journals

A new photoresist based on hyperbranched poly (ary1ene ether phosphine oxide)
Author
Insik In, Hyosan Lee, Tsuyohiko Fujigaya, Masaki Okazaki, Mitsuru Ueda, Sang youl Kim
Journal
Polymer bulletin
Vol, Part
49
Page Number
349-355
Publication Year
2003
IF
2.843
JCR
61.58%

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